Double patterning lithography: reducing the cost
dc.contributor.author | Miller, Andy | |
dc.contributor.author | Provoost, Jan | |
dc.contributor.author | Maenhoudt, Mireille | |
dc.date.accessioned | 2021-10-18T00:48:10Z | |
dc.date.available | 2021-10-18T00:48:10Z | |
dc.date.issued | 2009 | |
dc.identifier.issn | 1363-5182 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/15861 | |
dc.source | IIOimport | |
dc.title | Double patterning lithography: reducing the cost | |
dc.type | Journal article | |
dc.contributor.imecauthor | Miller, Andy | |
dc.contributor.imecauthor | Provoost, Jan | |
dc.source.peerreview | no | |
dc.source.beginpage | 66 | |
dc.source.endpage | 70 | |
dc.source.journal | Future Fab International | |
dc.source.issue | 29 | |
imec.availability | Published - imec |
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