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Double patterning lithography: reducing the cost

dc.contributor.authorMiller, Andy
dc.contributor.authorProvoost, Jan
dc.contributor.authorMaenhoudt, Mireille
dc.date.accessioned2021-10-18T00:48:10Z
dc.date.available2021-10-18T00:48:10Z
dc.date.issued2009
dc.identifier.issn1363-5182
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15861
dc.sourceIIOimport
dc.titleDouble patterning lithography: reducing the cost
dc.typeJournal article
dc.contributor.imecauthorMiller, Andy
dc.contributor.imecauthorProvoost, Jan
dc.source.peerreviewno
dc.source.beginpage66
dc.source.endpage70
dc.source.journalFuture Fab International
dc.source.issue29
imec.availabilityPublished - imec


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