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Influence of chemical additives on the surface reactivity of Si in KOH solution

dc.contributor.authorPhilipsen, Harold
dc.contributor.authorKelly, John J.
dc.date.accessioned2021-10-18T01:41:37Z
dc.date.available2021-10-18T01:41:37Z
dc.date.issued2009
dc.identifier.issn0013-4686
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16015
dc.sourceIIOimport
dc.titleInfluence of chemical additives on the surface reactivity of Si in KOH solution
dc.typeJournal article
dc.contributor.imecauthorPhilipsen, Harold
dc.contributor.orcidimecPhilipsen, Harold::0000-0002-5029-1104
dc.source.peerreviewyes
dc.source.beginpage3526
dc.source.endpage3531
dc.source.journalElectrochimica Acta
dc.source.issue13
dc.source.volume54
dc.identifier.urlhttp://dx.doi.org/10.1016/j.electacta.2008.12.044
imec.availabilityPublished - imec


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