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Nanocrystalline-diamond thin-films with high pH and penicillin sensitivity prepared on a capacitive Si-SiO2 structure

dc.contributor.authorPoghossian, A.
dc.contributor.authorAbouzar, M.H.
dc.contributor.authorRazavi, A.
dc.contributor.authorBäcker, M.
dc.contributor.authorBijnens, N.
dc.contributor.authorWilliams, Oliver
dc.contributor.authorHaenen, Ken
dc.contributor.authorMoritz, W.
dc.contributor.authorWagner, Patrick
dc.contributor.authorSchöning, M.J.
dc.date.accessioned2021-10-18T01:46:50Z
dc.date.available2021-10-18T01:46:50Z
dc.date.issued2009
dc.identifier.issn0013-4686
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16030
dc.sourceIIOimport
dc.titleNanocrystalline-diamond thin-films with high pH and penicillin sensitivity prepared on a capacitive Si-SiO2 structure
dc.typeJournal article
dc.contributor.imecauthorHaenen, Ken
dc.contributor.orcidimecHaenen, Ken::0000-0001-6711-7367
dc.source.peerreviewyes
dc.source.beginpage5981
dc.source.endpage5985
dc.source.journalElectrochimica Acta
dc.source.issue25
dc.source.volume54
imec.availabilityPublished - imec


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