Show simple item record

Physical degradation of gate dielectrics induced by local electrical stress using conductive atomic force microscopy

dc.contributor.authorPolspoel, Wouter
dc.contributor.authorFavia, Paola
dc.contributor.authorMody, Jay
dc.contributor.authorBender, Hugo
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-18T01:48:35Z
dc.date.available2021-10-18T01:48:35Z
dc.date.issued2009
dc.identifier.issn0021-8979
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16035
dc.sourceIIOimport
dc.titlePhysical degradation of gate dielectrics induced by local electrical stress using conductive atomic force microscopy
dc.typeJournal article
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.source.peerreviewyes
dc.source.beginpage24101
dc.source.journalJournal of Applied Physics
dc.source.issue2
dc.source.volume106
dc.identifier.urlhttp://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JAPIAU000106000002024101000001&idtype=cvips&gifs=Yes
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record