dc.contributor.author | Ronse, Kurt | |
dc.contributor.author | Jansen, Philippe | |
dc.contributor.author | Gronheid, Roel | |
dc.contributor.author | Hendrickx, Eric | |
dc.contributor.author | Maenhoudt, Mireille | |
dc.contributor.author | Wiaux, Vincent | |
dc.contributor.author | Goethals, Mieke | |
dc.contributor.author | Jonckheere, Rik | |
dc.contributor.author | Vandenberghe, Geert | |
dc.date.accessioned | 2021-10-18T02:27:51Z | |
dc.date.available | 2021-10-18T02:27:51Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16136 | |
dc.source | IIOimport | |
dc.title | Lithography options for the 32nm half pitch node and beyond | |
dc.type | Journal article | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.imecauthor | Gronheid, Roel | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.imecauthor | Wiaux, Vincent | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 1884 | |
dc.source.endpage | 1891 | |
dc.source.journal | IEEE Transactions on Circuits and Systems I: Regular Papers | |
dc.source.issue | 8 | |
dc.source.volume | 56 | |
imec.availability | Published - open access | |