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Plasma etching: from micro to nanoelectronics

dc.contributor.authorShamiryan, Denis
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorBoullart, Werner
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-18T02:56:24Z
dc.date.available2021-10-18T02:56:24Z
dc.date.issued2009
dc.identifier.issn0018-1439
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16207
dc.sourceIIOimport
dc.titlePlasma etching: from micro to nanoelectronics
dc.typeJournal article
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewyes
dc.source.beginpage250
dc.source.endpage258
dc.source.journalHigh Energy Chemistry
dc.source.issue3
dc.source.volume43
imec.availabilityPublished - imec


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