Show simple item record

Fluorinated polymethacrylates as highly sensitive nonchemically amplified e-beam resists

dc.contributor.authorStrahan, Jeffrey R.
dc.contributor.authorAdams, Jacob R.
dc.contributor.authorJen, Wei-Lun
dc.contributor.authorVanleenhove, Anja
dc.contributor.authorNeikirk, Colin C.
dc.contributor.authorRochelle, Timothy
dc.contributor.authorGronheid, Roel
dc.contributor.authorWillson, C. Grant
dc.date.accessioned2021-10-18T03:25:23Z
dc.date.available2021-10-18T03:25:23Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16277
dc.sourceIIOimport
dc.titleFluorinated polymethacrylates as highly sensitive nonchemically amplified e-beam resists
dc.typeJournal article
dc.contributor.imecauthorVanleenhove, Anja
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage43011
dc.source.journalJournal of Micro/Nanolithography, MEMS, and MOEMS
dc.source.issue4
dc.source.volume8
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
20094.pdf
Size:
266.3Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record