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Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasma–surface simulations and experiments

dc.contributor.authorTinck, Stefan
dc.contributor.authorBoullart, Werner
dc.contributor.authorBogaerts, Annemie
dc.date.accessioned2021-10-18T03:38:30Z
dc.date.available2021-10-18T03:38:30Z
dc.date.issued2009
dc.identifier.issn0022-3727
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16311
dc.sourceIIOimport
dc.titleInvestigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasma–surface simulations and experiments
dc.typeJournal article
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewyes
dc.source.beginpage95204
dc.source.endpage95217
dc.source.journalJournal of Physics D: Applied Physics
dc.source.volume42
imec.availabilityPublished - imec


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