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Effect of porogen residue on chemical, optical, and mechanical properties of CVD SiCOH low-k materials

dc.contributor.authorUrbanowicz, Adam
dc.contributor.authorVanstreels, Kris
dc.contributor.authorShamiryan, Denis
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-18T03:49:31Z
dc.date.available2021-10-18T03:49:31Z
dc.date.issued2009
dc.identifier.issn1099-0062
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16337
dc.sourceIIOimport
dc.titleEffect of porogen residue on chemical, optical, and mechanical properties of CVD SiCOH low-k materials
dc.typeJournal article
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpageH292
dc.source.endpageH295
dc.source.journalElectrochemical and Solid-State Letters
dc.source.issue8
dc.source.volume12
imec.availabilityPublished - imec


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