dc.contributor.author | Van Elshocht, Sven | |
dc.contributor.author | Adelmann, Christoph | |
dc.contributor.author | Lehnen, Peer | |
dc.contributor.author | De Gendt, Stefan | |
dc.date.accessioned | 2021-10-18T04:07:24Z | |
dc.date.available | 2021-10-18T04:07:24Z | |
dc.date.issued | 2009 | |
dc.identifier.issn | 1099-0062 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16381 | |
dc.source | IIOimport | |
dc.title | Equivalent oxide thickness reduction for high-k gate stacks by optimized rare-earth silicate reactions | |
dc.type | Journal article | |
dc.contributor.imecauthor | Van Elshocht, Sven | |
dc.contributor.imecauthor | Adelmann, Christoph | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.orcidimec | Van Elshocht, Sven::0000-0002-6512-1909 | |
dc.contributor.orcidimec | Adelmann, Christoph::0000-0002-4831-3159 | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.source.peerreview | yes | |
dc.source.beginpage | G17 | |
dc.source.endpage | G19 | |
dc.source.journal | Electrochemical and Solid-State Letters | |
dc.source.issue | 5 | |
dc.source.volume | 12 | |
dc.identifier.url | http://www.ecsdl.org/getabs/servlet/GetabsServlet?prog=normal&id=ESLEF6000012000005000G17000001&idtype=cvips&gifs=Yes | |
imec.availability | Published - imec | |