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Particle emission from chemically enhanced electron-beam-induced etching of Si: An approach for zero-energy secondary-ion mass spectrometry

dc.contributor.authorVanhove, Nico
dc.contributor.authorLievens, Peter
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-18T04:32:49Z
dc.date.available2021-10-18T04:32:49Z
dc.date.issued2009
dc.identifier.issn1098-0121
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16442
dc.sourceIIOimport
dc.titleParticle emission from chemically enhanced electron-beam-induced etching of Si: An approach for zero-energy secondary-ion mass spectrometry
dc.typeJournal article
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewyes
dc.source.beginpage35305
dc.source.journalPhysical Review B
dc.source.issue3
dc.source.volume79
imec.availabilityPublished - imec


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