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Novel approach to simulation of the silylation bake in the DESIRE process

dc.contributor.authorWeiss, M.
dc.contributor.authorGoethals, Mieke
dc.date.accessioned2021-09-29T15:53:11Z
dc.date.available2021-09-29T15:53:11Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1657
dc.sourceIIOimport
dc.titleNovel approach to simulation of the silylation bake in the DESIRE process
dc.typeJournal article
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage313
dc.source.endpage316
dc.source.journalMicroelectronic Engineering
dc.source.volume30
imec.availabilityPublished - open access
imec.internalnotesMicro- and Nano Engineering; 26-28 Sept. 1995; Aix-en-Provence, France


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