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Diffractive phase-shift lithography photomask operating in proximity printing mode

dc.contributor.authorCirino, Giuseppe
dc.contributor.authorMansano, Ronaldo
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorCescato, Lucila
dc.contributor.authorGoncalves Neto, Luiz
dc.date.accessioned2021-10-18T15:36:01Z
dc.date.available2021-10-18T15:36:01Z
dc.date.issued2010
dc.identifier.issn1094-4087
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16871
dc.sourceIIOimport
dc.titleDiffractive phase-shift lithography photomask operating in proximity printing mode
dc.typeJournal article
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.source.peerreviewyes
dc.source.beginpage16387
dc.source.endpage16405
dc.source.journalOptics Express
dc.source.issue16
dc.source.volume18
dc.identifier.urlhttp://www.opticsinfobase.org/view_article.cfm?gotourl=http%3A%2F%2Fwww%2Eopticsinfobase%2Eorg%2FDirectPDFAccess%2F33421FF0%2DBD
imec.availabilityPublished - imec


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