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Polycrystalline silicon-germanium electrode contact technology improvement for MEMS applications

dc.contributor.authorClaes, Gert
dc.contributor.authorSeveri, Simone
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorCelis, Jean-Pierre
dc.contributor.authorWitvrouw, Ann
dc.date.accessioned2021-10-18T15:37:03Z
dc.date.available2021-10-18T15:37:03Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16878
dc.sourceIIOimport
dc.titlePolycrystalline silicon-germanium electrode contact technology improvement for MEMS applications
dc.typeProceedings paper
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1222-DD04-03
dc.source.conferenceMicroelectromechanical Systems - Materials and Devices III
dc.source.conferencedate30/11/2009
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - imec
imec.internalnotesMRS Symposium Proceedings; Vol. 1222


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