Alignment and averaging of scanning electron microscope image contours for optical proximity correction modeling purposes
dc.contributor.author | De Bisschop, Peter | |
dc.contributor.author | Van de Kerkhove, Jeroen | |
dc.date.accessioned | 2021-10-18T15:46:26Z | |
dc.date.available | 2021-10-18T15:46:26Z | |
dc.date.issued | 2010 | |
dc.identifier.issn | 1537-1646 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16935 | |
dc.source | IIOimport | |
dc.title | Alignment and averaging of scanning electron microscope image contours for optical proximity correction modeling purposes | |
dc.type | Journal article | |
dc.contributor.imecauthor | De Bisschop, Peter | |
dc.contributor.imecauthor | Van de Kerkhove, Jeroen | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 41302 | |
dc.source.journal | Journal of Micro/Nanolithography MEMS and MOEMS | |
dc.source.issue | 4 | |
dc.source.volume | 9 | |
imec.availability | Published - open access |