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Challenges in using optical lithography for the building of a 22 nm node 6T=-SRAM cell

dc.contributor.authorErcken, Monique
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorBaerts, Christina
dc.contributor.authorBrus, Stephan
dc.contributor.authorDe Backer, Johan
dc.contributor.authorDelvaux, Christie
dc.contributor.authorDemand, Marc
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorLocorotondo, Sabrina
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorVeloso, Anabela
dc.contributor.authorVerhaegen, Staf
dc.date.accessioned2021-10-18T16:15:22Z
dc.date.available2021-10-18T16:15:22Z
dc.date.issued2010
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17078
dc.sourceIIOimport
dc.titleChallenges in using optical lithography for the building of a 22 nm node 6T=-SRAM cell
dc.typeJournal article
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorBaerts, Christina
dc.contributor.imecauthorBrus, Stephan
dc.contributor.imecauthorDe Backer, Johan
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorLocorotondo, Sabrina
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage993
dc.source.endpage996
dc.source.journalMicroelectronic Engineering
dc.source.issue5_8
dc.source.volume87
imec.availabilityPublished - open access
imec.internalnotespaper from MNE 2009


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