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Manufacturable DUV lithography processes for 0.25 μm technology contact and via layers

dc.contributor.authorBaker, Daniel
dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorBotermans, Harry
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-30T07:55:33Z
dc.date.available2021-09-30T07:55:33Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1716
dc.sourceIIOimport
dc.titleManufacturable DUV lithography processes for 0.25 μm technology contact and via layers
dc.typeJournal article
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage517
dc.source.endpage522
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume35
imec.availabilityPublished - imec


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