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NBTI lifetime prediction and kinetics at operation bias based on ultrafast pulse measurement

dc.contributor.authorJi, Zhigang
dc.contributor.authorLin, L.
dc.contributor.authorZhang, Jian Fu
dc.contributor.authorKaczer, Ben
dc.contributor.authorGroeseneken, Guido
dc.date.accessioned2021-10-18T17:24:10Z
dc.date.available2021-10-18T17:24:10Z
dc.date.issued2010
dc.identifier.issn0018-9383
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17324
dc.sourceIIOimport
dc.titleNBTI lifetime prediction and kinetics at operation bias based on ultrafast pulse measurement
dc.typeJournal article
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.source.peerreviewyes
dc.source.beginpage228
dc.source.endpage237
dc.source.journalIEEE Transactions on Electron Devices
dc.source.issue1
dc.source.volume57
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/freeabs_all.jsp?arnumber=5350729
imec.availabilityPublished - imec


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