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Study of EUV resist outgassing/contamination for device integration using EUVL processes

dc.contributor.authorPollentier, Ivan
dc.date.accessioned2021-10-18T20:23:18Z
dc.date.available2021-10-18T20:23:18Z
dc.date.issued2010
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17817
dc.sourceIIOimport
dc.titleStudy of EUV resist outgassing/contamination for device integration using EUVL processes
dc.typeJournal article
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage605
dc.source.endpage612
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.volume23
imec.availabilityPublished - open access


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