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Metrology for implanted Si substrate loss studies

dc.contributor.authorRadisic, Dunja
dc.contributor.authorShamiryan, Denis
dc.contributor.authorMannaert, Geert
dc.contributor.authorBoullart, Werner
dc.contributor.authorRosseel, Erik
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorGoossens, Jozefien
dc.contributor.authorMarrant, Koen
dc.contributor.authorBender, Hugo
dc.contributor.authorSonnemans, Roger
dc.contributor.authorBerry, Ivan
dc.date.accessioned2021-10-18T20:43:25Z
dc.date.available2021-10-18T20:43:25Z
dc.date.issued2010
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17867
dc.sourceIIOimport
dc.titleMetrology for implanted Si substrate loss studies
dc.typeJournal article
dc.contributor.imecauthorRadisic, Dunja
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorBender, Hugo
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpageH580
dc.source.endpageH584
dc.source.journalJournal of the Electrochemical Society
dc.source.issue5
dc.source.volume157
imec.availabilityPublished - open access


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