Pushing lithography to its limits
| dc.contributor.author | Ronse, Kurt | |
| dc.date.accessioned | 2021-10-18T20:58:52Z | |
| dc.date.available | 2021-10-18T20:58:52Z | |
| dc.date.issued | 2010-04 | |
| dc.identifier.issn | 1363-5182 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/17904 | |
| dc.source | IIOimport | |
| dc.title | Pushing lithography to its limits | |
| dc.type | Journal article | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.date.embargo | 9999-12-31 | |
| dc.source.peerreview | no | |
| dc.source.beginpage | 38 | |
| dc.source.endpage | 40 | |
| dc.source.journal | Future Fab International | |
| dc.source.issue | 33 | |
| imec.availability | Published - open access |