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The deposition Of Ru and RuO2 flms for DRAM electrode

dc.contributor.authorSchaekers, Marc
dc.contributor.authorCapon, Boris
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorBlasco, Nicolas
dc.date.accessioned2021-10-18T21:20:07Z
dc.date.available2021-10-18T21:20:07Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17954
dc.sourceIIOimport
dc.titleThe deposition Of Ru and RuO2 flms for DRAM electrode
dc.typeProceedings paper
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.source.peerreviewno
dc.source.beginpage135
dc.source.endpage144
dc.source.conferenceAtomic Layer Deposition Applications 6
dc.source.conferencedate10/10/2010
dc.source.conferencelocationLas Vegas, NV USA
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol. 33, Iss.2


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