TaN metal gate etch mechanisms in BCl3-based plasmas
dc.contributor.author | Shamiryan, Denis | |
dc.contributor.author | Danila, Andrey | |
dc.contributor.author | Baklanov, Mikhaïl | |
dc.contributor.author | Boullart, Werner | |
dc.date.accessioned | 2021-10-18T21:27:46Z | |
dc.date.available | 2021-10-18T21:27:46Z | |
dc.date.issued | 2010 | |
dc.identifier.issn | 0734-2101 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/17972 | |
dc.source | IIOimport | |
dc.title | TaN metal gate etch mechanisms in BCl3-based plasmas | |
dc.type | Journal article | |
dc.contributor.imecauthor | Boullart, Werner | |
dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 302 | |
dc.source.endpage | 305 | |
dc.source.journal | Journal of Vacuum Science and Technology A | |
dc.source.issue | 2 | |
dc.source.volume | 28 | |
imec.availability | Published - imec |
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