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In-line control of Si loss after post ion implantation strip

dc.contributor.authorShamiryan, Denis
dc.contributor.authorRadisic, Dunja
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-18T21:28:38Z
dc.date.available2021-10-18T21:28:38Z
dc.date.issued2010
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17974
dc.sourceIIOimport
dc.titleIn-line control of Si loss after post ion implantation strip
dc.typeJournal article
dc.contributor.imecauthorRadisic, Dunja
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewyes
dc.source.beginpage1669
dc.source.endpage1673
dc.source.journalMicroelectronic Engineering
dc.source.issue9
dc.source.volume87
imec.availabilityPublished - imec


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