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Reliability of copper low-k interconnects

dc.contributor.authorTokei, Zsolt
dc.contributor.authorCroes, Kristof
dc.contributor.authorBeyer, Gerald
dc.date.accessioned2021-10-18T22:22:14Z
dc.date.available2021-10-18T22:22:14Z
dc.date.issued2010
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18090
dc.sourceIIOimport
dc.titleReliability of copper low-k interconnects
dc.typeJournal article
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.source.peerreviewyes
dc.source.beginpage348
dc.source.endpage354
dc.source.journalMicroelectronic Engineering
dc.source.issue3
dc.source.volume87
imec.availabilityPublished - imec
imec.internalnotesMAM 2009


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