Show simple item record

Non-linear dielectric constant increase with Ti composition in high-k ALD-HfTiOx films after O2 crystallization annealing

dc.contributor.authorTomida, Kazuyuki
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorOpsomer, Karl
dc.contributor.authorMenou, Nicolas
dc.contributor.authorWang, Wan-Chih
dc.contributor.authorDelabie, Annelies
dc.contributor.authorSwerts, Johan
dc.contributor.authorSteenbergen, Johnny
dc.contributor.authorKaczer, Ben
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorAfanasiev, Valeri
dc.contributor.authorWouters, Dirk
dc.contributor.authorKittl, Jorge
dc.date.accessioned2021-10-18T22:25:43Z
dc.date.available2021-10-18T22:25:43Z
dc.date.issued2010
dc.identifier.issn1757-8981
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18097
dc.sourceIIOimport
dc.titleNon-linear dielectric constant increase with Ti composition in high-k ALD-HfTiOx films after O2 crystallization annealing
dc.typeJournal article
dc.contributor.imecauthorTomida, Kazuyuki
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorSteenbergen, Johnny
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorAfanasiev, Valeri
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewyes
dc.source.beginpage12023
dc.source.journalIOP Conference Series: Materials Science and Engineering
dc.source.issue1
dc.source.volume8
dc.identifier.urlhttp://iopscience.iop.org/1757-899X/8/1/012023
imec.availabilityPublished - imec
imec.internalnotesPaper from E-MRS Spring Meeting 2009


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record