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Electron beam induced etching of silicon with SF6

dc.contributor.authorVanhove, Nico
dc.contributor.authorLievens, Peter
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-18T23:31:58Z
dc.date.available2021-10-18T23:31:58Z
dc.date.issued2010
dc.identifier.issn1071-1023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18240
dc.sourceIIOimport
dc.titleElectron beam induced etching of silicon with SF6
dc.typeJournal article
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1206
dc.source.endpage1209
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue6
dc.source.volume28
imec.availabilityPublished - open access


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