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Experimental verification of source-mask optimization and freeform illumination for 22 nm node SRAM cells

dc.contributor.authorBekaert, Joost
dc.contributor.authorLaenens, Bart
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorVan Look, Lieve
dc.contributor.authorTrivkovic, Darko
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorVan Adrichem, Paul
dc.contributor.authorSocha, Robert
dc.contributor.authorHsu, Stephen
dc.contributor.authorLiu, Hua Yu
dc.contributor.authorMouraille, Orion
dc.contributor.authorSchreel, Koen
dc.contributor.authorDusa, Mircea
dc.contributor.authorZimmermann, Joerg
dc.contributor.authorGräupner, Paul
dc.contributor.authorNeumann, Jens Timo
dc.date.accessioned2021-10-19T12:32:32Z
dc.date.available2021-10-19T12:32:32Z
dc.date.issued2011-03
dc.identifier.issn1537-1646
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18540
dc.sourceIIOimport
dc.titleExperimental verification of source-mask optimization and freeform illumination for 22 nm node SRAM cells
dc.typeJournal article
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorTrivkovic, Darko
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorVan Adrichem, Paul
dc.contributor.imecauthorDusa, Mircea
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage13008
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.issue1
dc.source.volume10
imec.availabilityPublished - open access


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