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BEOL technology at 20nm half-pitch

dc.contributor.authorBeyer, Gerald
dc.contributor.authorTokei, Zsolt
dc.date.accessioned2021-10-19T12:34:23Z
dc.date.available2021-10-19T12:34:23Z
dc.date.issued2011
dc.identifier.issn0038-111X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18563
dc.sourceIIOimport
dc.titleBEOL technology at 20nm half-pitch
dc.typeJournal article
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorTokei, Zsolt
dc.source.peerreviewno
dc.source.beginpage16
dc.source.endpage17
dc.source.journalSolid State Technology
dc.source.issue5
dc.source.volume54
dc.identifier.urlhttp://www.electroiq.com/articles/sst/print/volume-54/issue-5/features/interconnect-structures/beol-technology-at-20nm-half-pitc
imec.availabilityPublished - imec


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