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Epitaxy-free monocrystalline silicon thin films: identifying the mechanisms behind lifetime degradation upon multiple high-temperature annealings

dc.contributor.authorDepauw, Valerie
dc.contributor.authorSimoen, Eddy
dc.contributor.authorGordon, Ivan
dc.contributor.authorPoortmans, Jef
dc.date.accessioned2021-10-19T13:14:04Z
dc.date.available2021-10-19T13:14:04Z
dc.date.issued2011
dc.identifier.issn0031-8965
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18831
dc.sourceIIOimport
dc.titleEpitaxy-free monocrystalline silicon thin films: identifying the mechanisms behind lifetime degradation upon multiple high-temperature annealings
dc.typeJournal article
dc.contributor.imecauthorDepauw, Valerie
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorGordon, Ivan
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecDepauw, Valerie::0000-0003-2045-9698
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecGordon, Ivan::0000-0002-0713-8403
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewyes
dc.source.beginpage600
dc.source.endpage603
dc.source.journalPhysica Status Solidi A
dc.source.issue3
dc.source.volume208
imec.availabilityPublished - imec


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