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Study of photon induced volatilization of copper and process control of metal etch plasmas

dc.contributor.authorDictus, Dries
dc.date.accessioned2021-10-19T13:16:46Z
dc.date.available2021-10-19T13:16:46Z
dc.date.issued2011-01
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18844
dc.sourceIIOimport
dc.titleStudy of photon induced volatilization of copper and process control of metal etch plasmas
dc.typePHD thesis
dc.contributor.imecauthorDictus, Dries
dc.contributor.orcidimecDictus, Dries::0000-0002-7896-1747
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.contributor.thesisadvisorDe Gendt, Stefan
imec.availabilityPublished - open access


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