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Point of use HF purification for silicon surface preparation by ion exchange

dc.contributor.authorFyen, Wim
dc.contributor.authorMouche, Laurent
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.contributor.authorZahka, J.
dc.date.accessioned2021-09-30T08:18:07Z
dc.date.available2021-09-30T08:18:07Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1889
dc.sourceIIOimport
dc.titlePoint of use HF purification for silicon surface preparation by ion exchange
dc.typeJournal article
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage2189
dc.source.endpage2196
dc.source.journalJournal of the Electrochemical Society
dc.source.issue6
dc.source.volume144
imec.availabilityPublished - open access


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