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Nanobeam dffraction: technique evaluation and strain measurement on complementary metal oxide semiconductor devices

dc.contributor.authorFavia, Paola
dc.contributor.authorBargallo Gonzalez, Mireia
dc.contributor.authorSimoen, Eddy
dc.contributor.authorVerheyen, Peter
dc.contributor.authorKlenov, Dmitri
dc.contributor.authorBender, Hugo
dc.date.accessioned2021-10-19T13:29:48Z
dc.date.available2021-10-19T13:29:48Z
dc.date.issued2011
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18900
dc.sourceIIOimport
dc.titleNanobeam dffraction: technique evaluation and strain measurement on complementary metal oxide semiconductor devices
dc.typeJournal article
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorBender, Hugo
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.source.peerreviewyes
dc.source.beginpageH438
dc.source.endpageH446
dc.source.journalJournal of the Electrochemical Society
dc.source.issue4
dc.source.volume158
imec.availabilityPublished - imec


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