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ToFSIMS and XPS study of ion implanted 248nm deep ultraviolet (DUV) photoresist

dc.contributor.authorFranquet, Alexis
dc.contributor.authorTsvetanova, Diana
dc.contributor.authorConard, Thierry
dc.contributor.authorVos, Rita
dc.contributor.authorVereecke, Guy
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-19T13:37:57Z
dc.date.available2021-10-19T13:37:57Z
dc.date.issued2011
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18932
dc.sourceIIOimport
dc.titleToFSIMS and XPS study of ion implanted 248nm deep ultraviolet (DUV) photoresist
dc.typeJournal article
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorTsvetanova, Diana
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage677
dc.source.endpage679
dc.source.journalMicroelectronic Engineering
dc.source.issue5
dc.source.volume88
imec.availabilityPublished - open access


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