Show simple item record

Recent advancements in EUV resist materials and process performance

dc.contributor.authorGoethals, Mieke
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorHosokawa, Kohei
dc.contributor.authorPollentier, Ivan
dc.date.accessioned2021-10-19T13:47:47Z
dc.date.available2021-10-19T13:47:47Z
dc.date.issued2011
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18969
dc.sourceIIOimport
dc.titleRecent advancements in EUV resist materials and process performance
dc.typeJournal article
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage25
dc.source.endpage31
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue1
dc.source.volume24
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
22857.pdf
Size:
961.0Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record