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dc.contributor.authorHussain, Muhammad M.
dc.contributor.authorShamiryan, Denis
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorSano, Kenichi
dc.contributor.authorReinhardt, Karen A.
dc.date.accessioned2021-10-19T14:26:49Z
dc.date.available2021-10-19T14:26:49Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19102
dc.sourceIIOimport
dc.titleCleaning challenges of high-k/metal gate structures
dc.typeBook chapter
dc.contributor.imecauthorParaschiv, Vasile
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage239
dc.source.bookHandbook of Cleaning in Semiconductor Manufacturing: Fundamental and Applications
dc.source.endpage284
imec.availabilityPublished - open access
imec.internalnotesChapter 7


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