Hyperthermal oxygen interacting with silicon surfaces : adsorption, implantation, and damage creation
dc.contributor.author | Neyts, Erik | |
dc.contributor.author | Khalilov, Umedjon | |
dc.contributor.author | Pourtois, Geoffrey | |
dc.contributor.author | van Duin, Adri | |
dc.date.accessioned | 2021-10-19T16:40:13Z | |
dc.date.available | 2021-10-19T16:40:13Z | |
dc.date.issued | 2011 | |
dc.identifier.issn | 1932-7447 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/19477 | |
dc.source | IIOimport | |
dc.title | Hyperthermal oxygen interacting with silicon surfaces : adsorption, implantation, and damage creation | |
dc.type | Journal article | |
dc.contributor.imecauthor | Pourtois, Geoffrey | |
dc.contributor.orcidimec | Pourtois, Geoffrey::0000-0003-2597-8534 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 48418 | |
dc.source.endpage | 4823 | |
dc.source.journal | Journal of Physical Chemistry C | |
dc.source.issue | 15 | |
dc.source.volume | 115 | |
imec.availability | Published - imec |
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