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Reliability of thin ZrO2 gate dielectric layers

dc.contributor.authorO'Connor, Robert
dc.contributor.authorHughes, Greg
dc.contributor.authorKauerauf, Thomas
dc.contributor.authorRagnarsson, Lars-Ake
dc.date.accessioned2021-10-19T16:49:09Z
dc.date.available2021-10-19T16:49:09Z
dc.date.issued2011
dc.identifier.issn0026-2714
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19499
dc.sourceIIOimport
dc.titleReliability of thin ZrO2 gate dielectric layers
dc.typeJournal article
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.source.peerreviewyes
dc.source.beginpage1118
dc.source.endpage1122
dc.source.journalMicroelectronics Reliability
dc.source.issue6
dc.source.volume51
imec.availabilityPublished - imec


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