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Ultrathin EOT high-k/metal gate devices for future technologies: challenges, achievements and perspectives

dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorChiarella, Thomas
dc.contributor.authorTogo, Mitsuhiro
dc.contributor.authorSchram, Tom
dc.contributor.authorAbsil, Philippe
dc.contributor.authorHoffmann, Thomas Y.
dc.date.accessioned2021-10-19T17:51:12Z
dc.date.available2021-10-19T17:51:12Z
dc.date.issued2011
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19649
dc.sourceIIOimport
dc.titleUltrathin EOT high-k/metal gate devices for future technologies: challenges, achievements and perspectives
dc.typeJournal article
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1317
dc.source.endpage1322
dc.source.journalMicroelectronic Engineering
dc.source.issue7
dc.source.volume88
dc.identifier.urlhttp://www.sciencedirect.com/science/article/B6V0W-52H3RND-X/2/0a4f4c035832adcd613c77737a87a0a9
imec.availabilityPublished - open access


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