The future of lithography

dc.contributor.author	Ronse, Kurt
dc.date.accessioned	2021-10-19T18:15:40Z
dc.date.available	2021-10-19T18:15:40Z
dc.date.issued	2011
dc.identifier.issn	0038-111X
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/19704
dc.source	IIOimport
dc.title	The future of lithography
dc.type	Journal article
dc.contributor.imecauthor	Ronse, Kurt
dc.contributor.orcidimec	Ronse, Kurt::0000-0003-0803-4267
dc.date.embargo	9999-12-31
dc.source.peerreview	no
dc.source.beginpage	13
dc.source.endpage	16
dc.source.journal	Solid State Technology
dc.source.issue	2
dc.source.volume	54
dc.identifier.url	http://www.electroiq.com/index/display/semiconductors-article-display/7921500372/articles/solid-state-technology/volume-54/issue
imec.availability	Published - open access