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Atomic layer deposition of Al2O3 for industrial local Al back-surface field (BSF) solar cells

dc.contributor.authorRothschild, Aude
dc.contributor.authorVermang, Bart
dc.contributor.authorGoverde, Hans
dc.date.accessioned2021-10-19T18:18:16Z
dc.date.available2021-10-19T18:18:16Z
dc.date.issued2011
dc.identifier.issn1757-1197
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19710
dc.sourceIIOimport
dc.titleAtomic layer deposition of Al2O3 for industrial local Al back-surface field (BSF) solar cells
dc.typeJournal article
dc.contributor.imecauthorVermang, Bart
dc.contributor.orcidimecVermang, Bart::0000-0003-2669-2087
dc.source.peerreviewno
dc.source.beginpage92
dc.source.endpage101
dc.source.journalPhotovoltaics International. The Technology Resource for PV Professionals
dc.source.issue13
imec.availabilityPublished - imec


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