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Impact of forming gas annealing and firing on the Al2O3/p-Si interface state spectrum

dc.contributor.authorSimoen, Eddy
dc.contributor.authorRothschild, Aude
dc.contributor.authorVermang, Bart
dc.contributor.authorPoortmans, Jef
dc.contributor.authorMertens, Robert
dc.date.accessioned2021-10-19T18:56:02Z
dc.date.available2021-10-19T18:56:02Z
dc.date.issued2011
dc.identifier.issn1099-0062
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19794
dc.sourceIIOimport
dc.titleImpact of forming gas annealing and firing on the Al2O3/p-Si interface state spectrum
dc.typeJournal article
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorVermang, Bart
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.imecauthorMertens, Robert
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecVermang, Bart::0000-0003-2669-2087
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpageH362
dc.source.endpageH364
dc.source.journalElectrochemical and Solid-State Letters
dc.source.issue9
dc.source.volume14
imec.availabilityPublished - open access


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