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Simple ultraviolet-based soft-lithography process for fabrication of low-loss polymer polysiloxanes-based waveguides

dc.contributor.authorTeng, J.
dc.contributor.authorYan, H.
dc.contributor.authorLi, L.
dc.contributor.authorZhao, M.
dc.contributor.authorZhang, H.
dc.contributor.authorMorthier, Geert
dc.date.accessioned2021-10-19T19:34:37Z
dc.date.available2021-10-19T19:34:37Z
dc.date.issued2011-12
dc.identifier.issn1751-8768
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19876
dc.sourceIIOimport
dc.titleSimple ultraviolet-based soft-lithography process for fabrication of low-loss polymer polysiloxanes-based waveguides
dc.typeJournal article
dc.contributor.imecauthorMorthier, Geert
dc.contributor.orcidimecMorthier, Geert::0000-0003-1819-6489
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage265
dc.source.endpage269
dc.source.journalIET Optoelectronics
dc.source.issue6
dc.source.volume5
imec.availabilityPublished - open access


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