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Transmission electron microscopic studies of ternary FeNi-silicide layers prepared by metal vapour vacuum arc ion implantation

dc.contributor.authorLi, X. N.
dc.contributor.authorJin, S.
dc.contributor.authorDong, C.
dc.contributor.authorZhang, Zheng
dc.contributor.authorGong, Z. X.
dc.contributor.authorMa, T. C.
dc.date.accessioned2021-09-30T09:17:05Z
dc.date.available2021-09-30T09:17:05Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1989
dc.sourceIIOimport
dc.titleTransmission electron microscopic studies of ternary FeNi-silicide layers prepared by metal vapour vacuum arc ion implantation
dc.typeJournal article
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage196
dc.source.endpage200
dc.source.journalThin Solid Films
dc.source.issue1_2
dc.source.volume304
imec.availabilityPublished - open access


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