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Degradation of 248nm deep UV photoresist by ion implantation

dc.contributor.authorTsvetanova, Diana
dc.contributor.authorVos, Rita
dc.contributor.authorVereecke, Guy
dc.contributor.authorParac-Vogt, Tatjana
dc.contributor.authorClemente, Francesca
dc.contributor.authorVanstreels, Kris
dc.contributor.authorRadisic, Dunja
dc.contributor.authorConard, Thierry
dc.contributor.authorFranquet, Alexis
dc.contributor.authorJivanescu, M.
dc.contributor.authorNguyen, D. A. P.
dc.contributor.authorStesmans, Andre
dc.contributor.authorBrijs, Bert
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-19T19:57:20Z
dc.date.available2021-10-19T19:57:20Z
dc.date.issued2011
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19923
dc.sourceIIOimport
dc.titleDegradation of 248nm deep UV photoresist by ion implantation
dc.typeJournal article
dc.contributor.imecauthorTsvetanova, Diana
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorRadisic, Dunja
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorStesmans, Andre
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.source.peerreviewyes
dc.source.beginpageH785
dc.source.endpageH794
dc.source.journalJournal of the Electrochemical Society
dc.source.issue8
dc.source.volume158
imec.availabilityPublished - imec


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