Show simple item record

Mask line roughness contribution in EUV lithography

dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-19T20:01:46Z
dc.date.available2021-10-19T20:01:46Z
dc.date.issued2011
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19932
dc.sourceIIOimport
dc.titleMask line roughness contribution in EUV lithography
dc.typeJournal article
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage2167
dc.source.endpage2170
dc.source.journalMicroelectronic Engineering
dc.source.issue8
dc.source.volume88
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
22914.pdf
Size:
1.379Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record