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New lithographic requirements for the implant levels in scaled devices

dc.contributor.authorVandeweyer, Tom
dc.contributor.authorBaerts, Christina
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorErcken, Monique
dc.date.accessioned2021-10-19T20:44:22Z
dc.date.available2021-10-19T20:44:22Z
dc.date.issued2011
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20023
dc.sourceIIOimport
dc.titleNew lithographic requirements for the implant levels in scaled devices
dc.typeJournal article
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorBaerts, Christina
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorErcken, Monique
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage2171
dc.source.endpage2173
dc.source.journalMicroelectronic Engineering
dc.source.issue8
dc.source.volume88
imec.availabilityPublished - open access


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