dc.contributor.author | Vandeweyer, Tom | |
dc.contributor.author | Baerts, Christina | |
dc.contributor.author | Horiguchi, Naoto | |
dc.contributor.author | Ercken, Monique | |
dc.date.accessioned | 2021-10-19T20:44:22Z | |
dc.date.available | 2021-10-19T20:44:22Z | |
dc.date.issued | 2011 | |
dc.identifier.issn | 0167-9317 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20023 | |
dc.source | IIOimport | |
dc.title | New lithographic requirements for the implant levels in scaled devices | |
dc.type | Journal article | |
dc.contributor.imecauthor | Vandeweyer, Tom | |
dc.contributor.imecauthor | Baerts, Christina | |
dc.contributor.imecauthor | Horiguchi, Naoto | |
dc.contributor.imecauthor | Ercken, Monique | |
dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 2171 | |
dc.source.endpage | 2173 | |
dc.source.journal | Microelectronic Engineering | |
dc.source.issue | 8 | |
dc.source.volume | 88 | |
imec.availability | Published - open access | |