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Influence of the UV cure on advanced plasma enhanced chemical vapour deposition low-k materials

dc.contributor.authorVerdonck, Patrick
dc.contributor.authorVan Besien, Els
dc.contributor.authorVanstreels, Kris
dc.contributor.authorTrompoukis, Christos
dc.contributor.authorUrbanowicz, Adam
dc.contributor.authorDe Roest, David
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-19T20:59:05Z
dc.date.available2021-10-19T20:59:05Z
dc.date.issued2011
dc.identifier.issn0021-4922
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20053
dc.sourceIIOimport
dc.titleInfluence of the UV cure on advanced plasma enhanced chemical vapour deposition low-k materials
dc.typeJournal article
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorVan Besien, Els
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorDe Roest, David
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecVan Besien, Els::0000-0002-5174-2229
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage05EB05
dc.source.journalJapanese Journal of Applied Physics
dc.source.issue5
dc.source.volume50
imec.availabilityPublished - open access


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