dc.contributor.author | Vermang, Bart | |
dc.contributor.author | Rothschild, Aude | |
dc.contributor.author | John, Joachim | |
dc.contributor.author | Poortmans, Jef | |
dc.contributor.author | Mertens, Robert | |
dc.date.accessioned | 2021-10-19T21:10:21Z | |
dc.date.available | 2021-10-19T21:10:21Z | |
dc.date.issued | 2011 | |
dc.identifier.issn | 1062-7995 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20075 | |
dc.source | IIOimport | |
dc.title | Spatially separated atomic layer deposition of Al2O3, a new option for high-throughput Si solar cell passivation | |
dc.type | Journal article | |
dc.contributor.imecauthor | Vermang, Bart | |
dc.contributor.imecauthor | John, Joachim | |
dc.contributor.imecauthor | Poortmans, Jef | |
dc.contributor.imecauthor | Mertens, Robert | |
dc.contributor.orcidimec | Vermang, Bart::0000-0003-2669-2087 | |
dc.contributor.orcidimec | Poortmans, Jef::0000-0003-2077-2545 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 733 | |
dc.source.endpage | 739 | |
dc.source.journal | Progress in Photovoltaics Research and Applications | |
dc.source.issue | 6 | |
dc.source.volume | 19 | |
dc.identifier.url | http://onlinelibrary.wiley.com/doi/10.1002/pip.1092/pdf | |
imec.availability | Published - imec | |