Ge and InP selective epitaxial growth on Si substrates for advanced CMOS devices
| dc.contributor.author | Wang, Gang | |
| dc.date.accessioned | 2021-10-19T21:37:31Z | |
| dc.date.available | 2021-10-19T21:37:31Z | |
| dc.date.issued | 2011-03 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20127 | |
| dc.source | IIOimport | |
| dc.title | Ge and InP selective epitaxial growth on Si substrates for advanced CMOS devices | |
| dc.type | PHD thesis | |
| dc.date.embargo | 9999-12-31 | |
| dc.source.peerreview | no | |
| dc.contributor.thesisadvisor | Heyns, Marc | |
| dc.contributor.thesisadvisor | Seefeld, M. | |
| imec.availability | Published - open access |